Author: Александр Запевалин

Author's name: Запевалин Александр

Author's website: http://vk.com/id7667329

Articles of the author in journal «Modern scientific researches and innovations»

Overview of gas-phase chemistry used for plasma chemical etching Si, SiO2 and Si3N4.

№ 6 June 2014 | Category: 01.00.00 Physics and mathematics

Overview of gas-phase chemistry for dry etching semiconductor compounds

№ 6 June 2014 | Category: 02.00.00 Chemistry

Articles of the author in journal «Modern Technics and Technologies»

Zapevalin A.I. Lag effects in the plasma etching of silicon

June, 2014

Zapevalin A.I. An overview of high-Aspect process silicon etching

June, 2014