Articles by keyword «Реактивно-ионное травление»

Articles in journal «Modern scientific researches and innovations»

Overview of gas-phase chemistry used for plasma chemical etching Si, SiO2 and Si3N4.

№ 6 June 2014 | Category: 01.00.00 Physics and mathematics

Articles in journal «Modern Technics and Technologies»

Zapevalin A.I. An overview of high-Aspect process silicon etching

June, 2014