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MAGNETRON SPUTTERING SYSTEM WITH A LIQUID PHASE TARGET
Yuryeva Alena Victorovna
National research Tomsk polytechnic university
assistant
National research Tomsk polytechnic university
assistant
Abstract
The paper presents a review of original investigations on magnetron sputtering systems with liquid phase target. The basic feature of such technique is a generation of liquid phase in solid state target. It provides to form a magnetron discharge on target vapor. For this reason, magnetron sputtering systems with liquid target is used to deposition of thick metal films (10…100 µm) with high deposition rate (10…100 nm per second). Generally, it makes to increase of coatings quality, functional properties.
Keywords: evaporation, magnetron sputtering system with a liquid phase target, sputtering
Category: 05.00.00 Technical sciences
Article reference:
Magnetron sputtering system with a liquid phase target // Modern scientific researches and innovations. 2015. № 4. P. 1 [Electronic journal]. URL: https://web.snauka.ru/en/issues/2015/04/51541
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